New York City, 05 February 2019: The global Chemical Vapor Deposition (CVD) Market is anticipated to reach USD 47.2 billion by 2026, according
to a new study published by Polaris Market Research. Chemical Vapor Deposition
(CVD) is a vapor deposition technology used for depositing thin films on
different types of substrates. Some of the advantages associated with the
chemical vapor deposition include conformal thickness, the materials can be
deposited with very high purity, and that the deposition rate is higher
relative to the physical deposition processes.
Globally growing semiconductor industry
and increase in manufacturing of components for semiconductor devices has
primarily driven the chemical vapor deposition (CVD) market. Miniaturization of
components is the greatest need of today’s microelectronics industry, which can
be efficiently achieved by different chemical vapor deposition processes for
achieving homogeneously thin films.
North America chemical vapor deposition (CVD)
Market Share By End-Use Type, 2017-2026
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Rising manufacturing of solar modules
and cells on account of growing number of solar power plants globally has also
significantly contributed towards the growth of the chemical vapor deposition
(CVD) market. CVD is used for the preparation of high-temperature
materials such as ceramics, tungsten, and others, in manufacturing of the solar
cells, and high-temperature fibre composites. The CVD methods are also applied
in many other applications such as textile surface functionalization, inorganic
synthesis of materials, as coatings in many industrial applications, and in
chemical preparation of advanced ceramics.
Among different types CVD, atomic layer
chemical vapor deposition (ALCVD) and plasma-enhanced chemical vapor deposition
(PECVD) have witnessed high growth on account of their efficient
characteristics and excellent outputs. Atomic layer CVD is widely used for
achieving exceptionally conformal coatings, and PECVD is used for very
high deposition rates on metal surfaces. Some of the major factors considered
by the consumers for the type of CVD process include volatility of precursor
material, surface, rate of deposition for each process, feasibility of each
precursor at particular temperature and the material cost.
Miniaturization in the current scenario
is an ever-growing trend that has significantly led the microelectronics
industry and is driving the product innovation in the chemical vapor deposition
(CVD) market. Though the concept of miniaturization is very basic, taking
something and making it smaller but comes with higher costs. Also, the concept
is quite evident due to soaring demand for modern electronics, from embedded
sensors to versatile to versatile electronics consumer products, the size of
the device matters. Such outputs are greatly achieved by technologies such as
atomic layer CVD and plasma-enhanced CVD.
Competitive Landscape and Key Vendors:
CVD technology is broadly used in
regions with high electronics & semiconductor manufacturing. Asia Pacific
is the largest regional chemical vapor deposition (CVD) market for the chemical
vapour deposition due to high population and more consumption & production
of consumer electronics products. Similarly, the growing electronics industry
of countries such as India, Thailand, and Korea to boost the chemical vapor
deposition (CVD) market in this region.
The global chemical vapor deposition
(CVD) market is a consolidated industry. Some of the key players for the market
include Veeco Instruments Inc., Praxair Surface Technologies, Lam Research
Corporation, Applied Materials, Inc., Ulvac, Inc., Adeka Corporation, Tokyo
Electron Limited, and Air Liquide.
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